Authors: Jiang, Jiechao¹ (AUTHOR) jiangjc@uta.edu, Chetuya, Nonso Martin¹ (AUTHOR), Ngai, Joseph H.² (AUTHOR), Grzybowski, Gordon J.³ (AUTHOR), Meletis, Efstathios I.¹ (AUTHOR), Claflin, Bruce⁴ (AUTHOR)

Superior Title: Journal of Applied Physics. 4/28/2024, Vol. 135 Issue 16, p1-13. 13p.

Subject Terms: *PLASMA-enhanced chemical vapor deposition, *CHEMICAL vapor deposition, *METAL-insulator transitions, *EPITAXIAL layers, *THICK films, *BUFFER layers

Authors: Koam, Ali N. A.¹ (AUTHOR), Azeem, Muhammad² (AUTHOR) azeemali7009@gmail.com, Ahmad, Ali³ (AUTHOR)

Superior Title: PLoS ONE. 5/23/2024, Vol. 19 Issue 5, p1-15. 15p.

Subject Terms: *MOLECULAR beam epitaxy, *CHEMICAL vapor deposition, *BORON, *VALENCE (Chemistry), *THERMAL properties, *ENERGY storage

Authors: Nakata, Jyoji¹ (AUTHOR) cm9j-nkt@asahi-net.or.jp, Seki, Yuhei¹ (AUTHOR), Hoshino, Yasushi¹ (AUTHOR) yhoshino@kanagawa-u.ac.jp

Superior Title: Journal of Applied Physics. 5/21/2024, Vol. 135 Issue 19, p1-11. 11p.

Subject Terms: *DIAMOND thin films, *CHEMICAL vapor deposition, *DEPTH profiling, *IRRADIATION, *DIAMONDS, *ATOMS

Authors: Isa, Fabio^1,2 (AUTHOR), Schmidt, Javier A.³ (AUTHOR), Aghion, Stefano^2,4 (AUTHOR), Napolitani, Enrico⁵ (AUTHOR), Isella, Giovanni² (AUTHOR), Ferragut, Rafael² (AUTHOR) rafael.ferragut@polimi.it

Superior Title: Journal of Applied Physics. 4/28/2024, Vol. 135 Issue 16, p1-8. 8p.

Subject Terms: *POSITRON annihilation, *PLASMA-enhanced chemical vapor deposition, *SECONDARY ion mass spectrometry, *POSITRONS, *SEMICONDUCTOR defects, *DOPING agents (Chemistry), *CRYSTAL defects

Authors: Berger, Claudio¹ (AUTHOR) berger2claudio@gmail.com, Schneider, Michael¹ (AUTHOR), Pfusterschmied, Georg¹ (AUTHOR), Schmid, Ulrich¹ (AUTHOR)

Superior Title: Journal of Applied Physics. 4/28/2024, Vol. 135 Issue 16, p1-10. 10p.

Subject Terms: *PLASMA-enhanced chemical vapor deposition, *ACOUSTIC resonators, *SOUND waves, *THIN films, *ACOUSTIC surface waves, *ACOUSTIC impedance

Authors: Yan, Xiao¹ (AUTHOR), Diamond, Jacob M.^2,3,4 (AUTHOR), Fritz, Nathan J.² (AUTHOR), Matsuo, Satoshi² (AUTHOR), Rabbi, Kazi F.¹ (AUTHOR), Zarin, Ishrat¹ (AUTHOR), Miljkovic, Nenad^1,3,5,6 (AUTHOR), Braun, Paul V.^2,3,4 (AUTHOR), Sottos, Nancy R.^2,3,4 (AUTHOR)

Superior Title: Journal of Applied Physics. 4/28/2024, Vol. 135 Issue 16, p1-9. 9p.

Subject Terms: *CHEMICAL vapor deposition, *NICKEL films, *FINITE element method, *METAL coating, *AMORPHOUS silicon, *SILICON films

Authors: Wakamatsu, Takeru¹ (AUTHOR) wakamatsu.takeru.45e@st.kyoto-u.ac.jp, Isobe, Yuki¹ (AUTHOR), Takane, Hitoshi¹ (AUTHOR), Kaneko, Kentaro^1,2 (AUTHOR), Tanaka, Katsuhisa¹ (AUTHOR) tanaka.katsuhisa.4n@kyoto-u.ac.jp

Superior Title: Journal of Applied Physics. 4/21/2024, Vol. 135 Issue 15, p1-8. 8p.

Subject Terms: *SCHOTTKY barrier diodes, *CHEMICAL vapor deposition, *THIN films, *GERMANIUM films, *GALLIUM nitride films, *SECONDARY ion mass spectrometry, *CARRIER density

Authors: He, Yi¹ (AUTHOR), Ou, Kai¹ (AUTHOR) oukai@swjtu.edu.cn, Zhang, Wenting¹ (AUTHOR), Ni, Yuxiang¹ (AUTHOR), Xia, Yudong¹ (AUTHOR) ydxia@swjtu.edu.cn, Wang, Hongyan¹ (AUTHOR)

Superior Title: Journal of Applied Physics. 4/21/2024, Vol. 135 Issue 15, p1-10. 10p.

Subject Terms: *CHEMICAL vapor deposition, *PHOTODETECTORS, *OPTOELECTRONIC devices, *THIN films, *LIGHT absorption, *CHARGE carrier mobility, *PHOTOELECTRICITY

Authors: Shindler, Simon¹ (AUTHOR), Franklin, Trevor¹ (AUTHOR), Yang, Rong¹ (AUTHOR) ryang@cornell.edu

Superior Title: Journal of Chemical Physics. 4/14/2024, Vol. 160 Issue 14, p1-11. 11p.

Subject Terms: *CHEMICAL vapor deposition, *THIN films, *X-ray photoelectron spectroscopy, *ATOMIC force microscopy, *OPTICAL diffraction

Authors: Li, Qihang¹ (AUTHOR), Luo, Jinping¹ (AUTHOR), Li, Zaoyang¹ (AUTHOR) lizaoyang@mail.xjtu.edu.cn, Rummeli, Mark H.^2,3,4,5 (AUTHOR), Liu, Lijun¹ (AUTHOR) ljliu@mail.xjtu.edu.cn

Superior Title: Journal of Applied Physics. 3/28/2024, Vol. 135 Issue 12, p1-9. 9p.

Subject Terms: *CHEMICAL vapor deposition, *GRAPHENE, *CHEMICAL processes, *GAS phase reactions, *COMPUTATIONAL fluid dynamics, *NON-equilibrium reactions

Authors: Katta, Abishek¹ (AUTHOR), Alema, Fikadu² (AUTHOR), Brand, William² (AUTHOR), Gilankar, Advait¹ (AUTHOR), Osinsky, Andrei² (AUTHOR), Kalarickal, Nidhin Kurian¹ (AUTHOR) nidhin.kurian.kalarickal@asu.edu

Superior Title: Journal of Applied Physics. 2/21/2024, Vol. 135 Issue 7, p1-7. 7p.

Subject Terms: *ETCHING, *CHEMICAL vapor deposition, *ETCHING techniques, *SURFACE morphology

Authors: Kawano, Makoto¹ (AUTHOR) makoto.kawano@ntt.com, Hirama, Kazuyuki¹ (AUTHOR), Taniyasu, Yoshitaka¹ (AUTHOR), Kumakura, Kazuhide¹ (AUTHOR)

Superior Title: Journal of Applied Physics. 2/21/2024, Vol. 135 Issue 7, p1-5. 5p.

Subject Terms: *CHEMICAL vapor deposition, *MICROWAVE plasmas, *DIAMOND surfaces, *DIAMONDS

Authors: Yan, Wei¹ (AUTHOR) yanwei@njupt.edu.cn, Zhang, Zhi¹ (AUTHOR), Wan, Jihong¹ (AUTHOR), Meng, Lan² (AUTHOR), Li, Xing-ao¹ (AUTHOR) lxahbmy@126.com

Superior Title: Journal of Chemical Physics. 2/7/2024, Vol. 160 Issue 5, p1-6. 6p.

Subject Terms: *NANOPARTICLES, *CHEMICAL vapor deposition, *SINGLE crystals, *TRANSITION metals

Authors: Saha, Bhaskar Prasad¹, Jana, Dulal Chandra¹ janad@arci.res.in, Barick, Prasenjit¹, Natarajan, V.², Venkata, Suresh², Adoni, Abhijit A.³, Veeresha, D. R.³, Venkateswaran, R.⁴, Kamath, P. U.², Johnson, Roy¹, Sriram, K. V.⁴, Prasad, B. Raghavendra², Padmanabham, G.¹

Superior Title: Current Science (00113891). 12/25/2023, Vol. 125 Issue 12, p1323-1327. 5p.

Subject Terms: *SILICON carbide, *CHEMICAL vapor deposition, *SPECIFIC gravity, *ROOT-mean-squares, *SURFACE roughness, *CORONAL mass ejections

Authors: He, Fan¹ (AUTHOR), Jiang, Kunyao² (AUTHOR), Choi, Yeseul¹ (AUTHOR), Aronson, Benjamin L.¹ (AUTHOR), Shetty, Smitha¹ (AUTHOR), Tang, Jingyu² (AUTHOR), Liu, Bangzhi¹ (AUTHOR), Liu, Yongtao³ (AUTHOR), Kelley, Kyle P.³ (AUTHOR), Rayner Jr., Gilbert B.⁴ (AUTHOR), Davis, Robert F.^2,5 (AUTHOR), Porter, Lisa M.² (AUTHOR), Trolier-McKinstry, Susan^1,6 (AUTHOR) stmckinstry@psu.edu

Superior Title: Journal of Applied Physics. 11/28/2023, Vol. 134 Issue 20, p1-9. 9p.

Subject Terms: *METAL organic chemical vapor deposition, *ATOMIC layer deposition, *PIEZORESPONSE force microscopy, *PERMITTIVITY, *ELECTRICAL resistivity, *FERROELECTRICITY

Authors: Meier, Johanna¹ (AUTHOR), Häuser, Patrick² (AUTHOR), Blumberg, Christian² (AUTHOR), Smola, Tim¹ (AUTHOR), Prost, Werner² (AUTHOR), Weimann, Nils² (AUTHOR), Bacher, Gerd¹ (AUTHOR) gerd.bacher@uni-due.de

Superior Title: Journal of Applied Physics. 7/28/2023, Vol. 134 Issue 4, p1-8. 8p.

Subject Terms: *METAL organic chemical vapor deposition, *NANORODS, *INDIUM gallium nitride, *TRANSMISSION electron microscopes, *ELECTRON-hole recombination, *QUANTUM wells, *PHOTOLUMINESCENCE measurement

Authors: Freiberger, Eva Marie, Düll, Fabian, Bachmann, Phiona, Steinhauer, Johann, Williams, Federico J., Steinrück, Hans-Peter, Papp, Christian

Superior Title: Journal of Chemical Physics; 4/21/2024, Vol. 160 Issue 15, p1-9, 9p

Subject Terms: BORAZINE, X-ray photoelectron spectroscopy, CHEMICAL vapor deposition, X-ray absorption, SURFACE chemistry

Authors: Lebedev, Vadim, Kustermann, Jan, Engels, Jan, Weippert, Jürgen, Cimalla, Volker, Knittel, Peter, Kirste, Lutz, Giese, Christian, Quellmalz, Patricia, Graff, Andreas, Jeske, Jan

Superior Title: Journal of Applied Physics; 4/14/2024, Vol. 135 Issue 14, p1-13, 13p

Subject Terms: DIAMOND thin films, CRYSTAL grain boundaries, CHEMICAL vapor deposition, DIAMOND crystals, CRYSTAL orientation, DIAMONDS, EPITAXY, CARBON nanotubes

Authors: Falcone, Virginia¹ (AUTHOR) virginia.falcone@polimi.it, Barzaghi, Andrea¹ (AUTHOR), Signorelli, Fabio² (AUTHOR), Valente, Joao³ (AUTHOR), Firoozabadi, Saleh⁴ (AUTHOR), Zucchetti, Carlo⁵ (AUTHOR), Bergamaschini, Roberto⁶ (AUTHOR), Ballabio, Andrea¹ (AUTHOR), Bottegoni, Federico⁵ (AUTHOR), Zappa, Franco² (AUTHOR), Montalenti, Francesco⁶ (AUTHOR), Miglio, Leo⁶ (AUTHOR), Volz, Kerstin⁴ (AUTHOR), Paul, Douglas J.³ (AUTHOR), Biagioni, Paolo⁵ (AUTHOR), Tosi, Alberto² (AUTHOR), Isella, Giovanni¹ (AUTHOR)

Superior Title: Advanced Optical Materials. May2024, Vol. 12 Issue 14, p1-8. 8p.

Subject Terms: *PLASMA-enhanced chemical vapor deposition, *ELECTRON beam lithography, *INFRARED absorption, *CHEMICAL vapor deposition, *PHOTOTHERMAL effect, *NEAR infrared radiation, *EPITAXY, *MULTIPLICATION

Authors: Herrmann, Eric¹ (AUTHOR) eherrm@udel.edu, Wang, Xi¹ (AUTHOR) wangxi@udel.edu

Superior Title: IEEE Transactions on Semiconductor Manufacturing. Feb2024, Vol. 37 Issue 1, p87-92. 6p.

Subject Terms: PLASMA-enhanced chemical vapor deposition, SILICON nitride films, ELECTRON beam lithography, SILICON oxide films, SILICON oxide, PLASMA etching, RAMAN scattering