Authors: Venter, A., Nyamhere, C., Botha, J. R., Auret, F. D., Janse van Rensburg, P. J., Meyer, W. E., Coelho, S. M. M., Kolkovsky, V. l.

Superior Title: Journal of Applied Physics; Jan2012, Vol. 111 Issue 1, p013703, 4p, 1 Chart, 5 Graphs

Subject Terms: ARGON plasmas, GALLIUM arsenide, PLASMA etching, IRRADIATION, HYDROGEN plasmas, DEEP level transient spectroscopy, ARRHENIUS equation, ENTHALPY