Authors: Po-Yen Chien, Kuei-Shu Chang-Liao, Chung-Hao Fu
Contributors: 張廖貴術
Subject Terms: metal gate, MOS devices, thermal stability
Time: 22
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Relation: 2007 International Semiconductor Device Research Symposium (ISDRS),T.21, College Park, MD, USA; 1-4244-1891-7; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47108
Contributors: 呂平江
Subject Terms: THERMAL-STABILITY, CONFORMATIONAL STABILITY, AMINO-ACIDS
Time: 39
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Relation: COMPUTATIONAL BIOLOGY AND CHEMISTRY,Elsevier,Volume 33,Issue 6,DEC 2009,Pages 445-450; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/48709
Authors: Chung-Hao Fu, Po-Yen Chien, Kuei-Shu Chang-Liao, Tien-Ko Wang, Wen-Fa Wu
Contributors: 王天戈
Subject Terms: MoN, Metal gate, TiN, Thermal stability, Work function
Time: 22
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Relation: Solid-State Electronics, v 52, n 10, Oct. 2008, page 1512-17; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47517
Authors: Kuei-Shu Chang-Liao, Chin-Lung Cheng, Chun-Yuan Lu, Sahu, B.S., Tzu-Chen Wang, Tien-Ko Wang, Shang-Feng Huang, Wen-Fa Tsai, Chi-Fong Ai
Contributors: 王天戈
Subject Terms: clustered vertical furnace, HfxTayN, metal gate, MOS, thermal stability, ELECTRONIC-STRUCTURE, ATOMIC-SCALE, DIELECTRICS, OXIDE, SILICON, FILMS, ZRO2, HF, NM
Time: 22
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Relation: IEEE TRANSACTIONS ON ELECTRON DEVICES, Institute of Electrical and Electronics Engineers, Volume 54, Issue 2, FEB 2007, Pages 233-240; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47366
Authors: Wu, Fan-Bean, Su, Yu-Ming, Tsai, Yan-Zo, Duh, Jenq-Gong
Contributors: 杜正恭
Subject Terms: CHROMIUM NITRIDE COATINGS, THERMAL-STABILITY, AMORPHOUS-ALLOYS
Time: 3
File Description: 111 bytes; text/html
Relation: SURFACE & COATINGS TECHNOLOGY,Volume: 202,Issue: 4-7,Pages: 762-767,Published: DEC 15 2007; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/53205
Authors: Yan-Kai Chiou, Che-Hao Chang, Chen-Chan Wang, Kun-Yu Lee, Tai-Bor Wu, Raynien Kwo, Minghwei Hong
Contributors: 吳泰伯
Subject Terms: hafnium compounds, aluminium compounds, dielectric thin films, atomic layer deposition, thermal stability, amorphous state, noncrystalline structure, leakage currents, interface states
Time: 3
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Relation: J. Electrochem.Soc., Vol.154, pp. G99-G102.; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/52648
Authors: Chang-Ta Yang, Kuei-Shu Chang-Liao, Hsin-Chun Chang, Sahu, B.S., Tzu-Chen Wang, Tien-Ko Wang, Wen-Fa Wu
Contributors: 王天戈
Subject Terms: MOS, HfxTayN, HfOxNy, thermal stability, metal gate, high-k, EFFECTIVE WORK FUNCTION, THERMAL-INSTABILITY, LAYER, STABILITY, SILICON, ELECTRODES, OXIDES, STACK
Time: 22
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Relation: Microelectronic Engineering, Elsevier, Volume 84, Issue 12, December 2007, Pages 2916-2920; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47385
Authors: Cheng CL, Chang-Liao KS, Wang TC, Wang TK, Wang HCH
Contributors: 王天戈
Subject Terms: metal gate, thermal stability, work function
Time: 22
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Relation: IEEE ELECTRON DEVICE LETTERS, Institute of Electrical and Electronics Engineers, Volume 27, Issue 3, MAR 2006, Pages 148-150; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47330
Authors: Shih-Kang Tien, Jenq-Gong Duh
Contributors: 杜正恭
Subject Terms: CrN, AlN, Multilayer coating, Thermal stability, Hard coating
Time: 3
File Description: application/pdf; 258444 bytes
Relation: Thin Solid Films Volume 494, Issues 1-2, 3 January 2006, Pages 173-178; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/52495
Contributors: 張廖貴術
Subject Terms: GATE DIELECTRICS, ELECTRICAL-PROPERTIES, THERMAL-STABILITY, MOS DEVICES, HFO2, ELECTRODE, SURFACE, OXIDES, SIO2
Time: 22
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Relation: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v 24, n 4, p 1683-1688, July/August 2006; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47890
Contributors: 王天戈
Subject Terms: metal gate, thermal stability, MOS, HfxTayN, TaN, HfOxNy, INDUCED THERMAL-INSTABILITY, EFFECTIVE WORK FUNCTION, MOS DEVICES, STABILITY, SILICON, LAYER, FILMS, OXIDES, STACK
Time: 22
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Relation: Microelectronic Engineering, Elsevier, Volume 83, Issues 11-12, November-December 2006, Pages 2516-2521; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47346
Authors: Kuo-Hsin Chang, Chi-Chang Hu
Contributors: 胡啟章
Subject Terms: annealing, capacitance, crystal growth from solution, crystallites, lattice energy, nanostructured materials, porosity, ruthenium compounds, sol-gel processing, supercapacitors, thermal stability
Time: 24
File Description: application/pdf; 315663 bytes
Relation: APPLIED PHYSICS LETTERS, American Institute of Physics, Volume 88, Issue 19, MAY 8 2006; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/38129
Authors: Kuo-Hsin Chang, Chi-Chang Hu
Contributors: 胡啟章
Subject Terms: annealing, capacitance, crystal growth from solution, crystallites, lattice energy, nanostructured materials, porosity, ruthenium compounds, sol-gel processing, supercapacitors, thermal stability
Time: 24
File Description: application/pdf; 315663 bytes
Relation: APPLIED PHYSICS LETTERS, American Institute of Physics, Volume 88, Issue 19, MAY 8 2006; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/38130
Authors: S.-K Kim, Y.–C. Hung, B.-J Seo, K. Geary, W. Yuan, B. Bortnik, H. R. Fetterman, C. Wang, W. H. Steier, C. Zhang.
Contributors: 洪毓玨
Subject Terms: electro-optic polymer modulator, thermal stability, fiber-optic gyroscope
Time: 45
Relation: Applied Physics Letters, American Institute of Physics, Volume 87, Issue 6, Aug 2005, Pages 61112-1-3; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/73018
Authors: Jou, J.-H., Ming-Chen Sun, Wen-Kuo Weng, Yen-Shih Huang
Contributors: 周卓輝
Subject Terms: thermal stability, organic light-emitting devices, annealing, electrical properties and measurements, ELECTROLUMINESCENT DEVICES, DARK-SPOTS, ENERGY-TRANSFER, DIODES, DEGRADATION, MECHANISM, GROWTH, LAYERS
Time: 3
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Relation: Thin Solid Films Volume 491, Issues 1-2, 22 November 2005, Pages 260-263; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/52664
Authors: Ming-Chen Suna, Jwo-Huei Jou, Wen-Kuo Weng, Yen-Shih Huang
Contributors: 周卓輝
Subject Terms: Thermal stability, Organic light-emitting devices, Annealing, Electrical properties and measurements
Time: 3
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Relation: Thin Solid Films Volume 491, Issues 1-2, 22 November 2005, Pages 260-263; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/52372
Contributors: 杜正恭
Subject Terms: CHROMIUM NITRIDE COATINGS, THERMAL-STABILITY, CU-P
Time: 3
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Relation: SURFACE & COATINGS TECHNOLOGY,Volume: 177,Pages: 312-316,Published: JAN 30 2004; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/53200
Contributors: 杜正恭
Subject Terms: electroless Ni-P-W alloy coatings, differential scanning calorimetry, thermal stability
Time: 3
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Relation: Surface and Coatings Technology Volumes 177-178, 30 January 2004, Pages 532-536; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/52721
Contributors: 吳泰伯
Subject Terms: GATE DIELECTRIC STACKS, ATOMIC LAYER DEPOSITION, ELECTRONIC STRUCTURE, THERMAL STABILITY, TUNNELING CURRENT, INVERSION LAYER, OXIDE, MECHANISMS, SILICON, DEVICES
Time: 3
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Relation: Journal of Applied Physics,Browse Journal,Volume 96,Issue 1,DIELECTRICS AND FERROELECTRICITY (PACS 77); http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/52256
Contributors: 蔡哲正
Subject Terms: NICKEL SILICIDE FORMATION, SOLID-STATE REACTION, THERMAL-STABILITY
Time: 3
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Relation: JOURNAL OF THE ELECTROCHEMICAL SOCIETY,Volume: 151,Issue: 7,Pages: G452-G455,Published: 2004; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/52119