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Dissertation/ Thesis
利用快速脈衝雷射蒸鍍法成長氧化鋅薄膜

Authors: 蘇俊聰, Su, Chun Tsung

Contributors: 陳銘堯, 臺灣大學：物理研究所

Subject Terms: 氧化鋅, 脈衝雷射蒸鍍, pulsed laser deposition, ZnO, PLD

File Description: 2480965 bytes; application/pdf

Relation: [1] D. C. Look, Mater. Sci. Eng. B 80, 383 (2001) [2]陳銘堯,“簡介脈衝雷射蒸鍍法”,物理雙月刊,15卷,5期,P669,1993 [3] http://www.lambdaphysik.com/ [4] B.E.A. Saleh,M.C. Teich. Fundamentals of Photonics(John Wiley & Sons,Inc.) p92-94 [5] Oxford Applied Research,http://www.oaresearch.co.uk/HDSeries.pdf [6] http://global.kyocera.com/prdct/fc/product/pdf/s_c_sapphire.pdf [7] Y. Chen, D. M. Bagnall, H.-J. Ko, K.-T. Park, K. Hiraga, Z. Zhu, and T.Yao, J. Appl. Phys. 84, 3912 (1998) [8] Y.Chen,Hang-Ju Ko,Soon-Ku Hong,and Takafumi Yao, Appl. Phys. Lett. 76,559(2000) [9] D.Keith Bowen,High resolution X-Ray diffractometry and topography.(Taylor & Francis) [10]林明正,Ca3PbN薄膜的合成及結構,2001,臺灣大學物理學系碩士論文 [11]劉達人,鉍薄膜結構之生長及其巨大非線性光學性質之研究,2002臺灣大學物理學系博士論文 [12] D. C. Look, D. C. Reynolds, C. W. Litton, R. L. Jones, D. B. Eason, and G. Cantwell, Appl. Phys. Lett. 81,1830 (2002). [13] K. Thonke, Th. Gruber, N. Teofilov, R. Schönfelder, A. Waag, and R. Sauer, Physica B 308–310, 945 (2001). [14]C.F. Klingshirn,Semiconductor Optics,Springer(1995) p.240-244 [15]NT-MDT Co.,Solver Instruction manual [16]http://www.eeel.nist.gov/812/hall.html [17]Keithley 7065 Hall effect card Instruction manual [18] L. J. van der Pauw, "A Method of Measuring Specific Resistivity and Hall Effect of Discs of Arbitrary Shapes," Philips Res. Repts. 13, 1-9 (1958).; zh-TW; http://ntur.lib.ntu.edu.tw/handle/246246/54540; http://ntur.lib.ntu.edu.tw/bitstream/246246/54540/1/ntu-93-R91222032-1.pdf

Availability: http://ntur.lib.ntu.edu.tw/handle/246246/54540
http://ntur.lib.ntu.edu.tw/bitstream/246246/54540/1/ntu-93-R91222032-1.pdf


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