Authors: 賴韋志

Contributors: 光電科學與工程學系

Subject Terms: 三維磊晶成長；奈米尺度三維結構之氮化鋁銦鎵氮化鎵異質接面電晶體；氮化鋁銦鎵氮化鎵奈米鰭式異質接面電晶體；奈米級氮化鋁銦鎵氮化鎵垂直傳輸式異質接面電晶體, 3-dimensiponal MOCVD epitaxy； 3-D nano-structure Al(In)GaN/GaN HFET； Al(InN)GaN/GaN nano-fin HFET； nano-structure Al(In)GaN/GaN vertical HFET

File Description: 116 bytes; text/html

Relation: http://ir.lib.ncku.edu.tw/handle/987654321/202488; http://ir.lib.ncku.edu.tw/bitstream/987654321/202488/1/index.html

Availability: http://ir.lib.ncku.edu.tw/handle/987654321/202488
http://ir.lib.ncku.edu.tw/bitstream/987654321/202488/1/index.html

Authors: Amrillah, Tahta, Bitla, Yugandhar, Shin, Kwangwoo, Yang, Tiannan, Hsieh, Ying-Hui, Chiou, Yu-You, Liu, Heng-Jui, Do, Thi Hien, Su, Dong, Chen, Yi-Chun, Jen, Shien-Uang, Chen, Long-Qing, Kim, Kee Hoon, Juang, Jenh-Yih, Chu, Ying-Hao

Contributors: Department of Physics, Amrillah, Tahta, Bitla, Yugandhar, Shin, Kwangwoo, Yang, Tiannan, Hsieh, Ying-Hui, Chiou, Yu-You, Liu, Heng-Jui, Do, Thi Hien, Su, Dong, Chen, Yi-Chun, Jen, Shien-Uang, Chen, Long-Qing, Kim, Kee Hoon, Juang, Jenh-Yih, Chu, Ying-Hao

Subject Terms: magnetoelectric, bulk heterojunction, clamping effect, van der Waals epitaxy, flexible

File Description: 103 bytes; text/html

Relation: ACS NANO, Vol. 11, Issue, 11, pp.11542-11550; ACS NANO; Vol. 11; 11; 11542-11550

Availability: https://doi.org/10.1021/acsnano.7b02102
http://ir.lib.ncku.edu.tw/handle/987654321/183926
http://ir.lib.ncku.edu.tw/bitstream/987654321/183926/1/index.html

Authors: Liu, Heng-Jui, Wang, Chih-Kuo, Su, Dong, Amrillah, Tahta, Hsieh, Ying-Hui, Wu, Kun-Hong, Chen, Yi-Chun, Juang, Jenh-Yih, Eng, Lukas M., Jen, Shien-Uang, Chu, Ying-Hao

Contributors: Department of Physics, Liu, Heng-Jui, Wang, Chih-Kuo, Su, Dong, Amrillah, Tahta, Hsieh, Ying-Hui, Wu, Kun-Hong, Chen, Yi-Chun, Juang, Jenh-Yih, Eng, Lukas M., Jen, Shien-Uang, Chu, Ying-Hao

Subject Terms: flexible magnetic devices, cobalt ferrite (CoFe2O4), muscovite (mica), van der Waals epitaxy, magnetostriction

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Relation: ACS APPLIED MATERIALS & INTERFACES, Vol.9, No.8, pp.7297-7304; ACS APPLIED MATERIALS & INTERFACES; Vol.9; No.8

Availability: https://doi.org/10.1021/acsami.6b16485
http://ir.lib.ncku.edu.tw/handle/987654321/183925
http://ir.lib.ncku.edu.tw/bitstream/987654321/183925/1/index.html

Authors: Paul, Sumana, Ghosh, Sirshendu, Barma, Dulal, De, S. K.

Contributors: Department of Chemistry, Paul, Sumana, Ghosh, Sirshendu, Barma, Dulal, De, S. K.

Subject Terms: Hybrid nanoheterostructure, Bi2S3/TiO2/Au, Epitaxy formation, Photocatalyst, Plasmonic sensitization

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Relation: APPLIED CATALYSIS B-ENVIRONMENTAL, Volume: 219 Pages: 287-300; APPLIED CATALYSIS B-ENVIRONMENTAL; Volume: 219 Pages: 287-300

Availability: https://doi.org/10.1016/j.apcatb.2017.07.057
http://ir.lib.ncku.edu.tw/handle/987654321/183906
http://ir.lib.ncku.edu.tw/bitstream/987654321/183906/1/index.html

Authors: 黃榮俊

Contributors: 物理學系（所）, 黃榮俊

Subject Terms: 拓撲絕緣體；分子束外延；狄拉克費米子；費米子自旋；stanene；STM；ARPES；自旋, topological insulator； molecular beam epitaxy； Dirac fermion； Rashba fermion； stanene； STM； ARPES； spintronic

Availability: http://ir.lib.ncku.edu.tw/handle/987654321/187420
http://ir.lib.ncku.edu.tw/bitstream/987654321/187420/1/index.html

Authors: 賴韋志

Contributors: 光電科學與工程學系, 賴韋志

Subject Terms: 三維磊晶成長；奈米尺度三維結構之氮化鋁銦鎵氮化鎵異質接面電晶體；氮化鋁銦鎵氮化鎵奈米鰭式異質接面電晶體；奈米級氮化鋁銦鎵氮化鎵垂直傳輸式異質接面電晶體, 3-dimensiponal MOCVD epitaxy； 3-D nano-structure Al(In)GaN/GaN HFET； Al(InN)GaN/GaN nano-fin HFET； nano-structure Al(In)GaN/GaN vertical HFET

Availability: http://ir.lib.ncku.edu.tw/handle/987654321/187373
http://ir.lib.ncku.edu.tw/bitstream/987654321/187373/1/index.html

Authors: 戴鳳純, Tai, Feng-Chun

Contributors: 物理學系, 黃榮俊, Huang, Jung-Chun

Subject Terms: 拓樸絕緣體, 能帶結構, 分子束磊晶, 費米能階, 角分析光電子能譜, magnetic topological insulator, band structure, Molecular beam epitaxy, surface state, ARPES

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Relation: http://ir.lib.ncku.edu.tw/handle/987654321/216976; http://ir.lib.ncku.edu.tw/bitstream/987654321/216976/1/index.html

Availability: http://ir.lib.ncku.edu.tw/handle/987654321/216976
http://ir.lib.ncku.edu.tw/bitstream/987654321/216976/1/index.html

Authors: Tsai, Chen-Hung, Ma, Mu-Hsin, Yin, Yu-Feng, Li, Hsiang-Wei, Lai, Wei-Chih, Huang, Jianjang

Contributors: Department of Photonics

Subject Terms: Light-emitting diodes, buffer layer, epitaxy

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Relation: IEEE Journal of Quantum Electronics, Vol. 51, No. 5; http://ir.lib.ncku.edu.tw/handle/987654321/161466; http://ir.lib.ncku.edu.tw/bitstream/987654321/161466/1/index.html

Availability: https://doi.org/10.1109/JQE.2015.2412957
http://ir.lib.ncku.edu.tw/handle/987654321/161466
http://ir.lib.ncku.edu.tw/bitstream/987654321/161466/1/index.html

Authors: Liang, Yu-Ling, Lu, Shih-Zong, Lee, Hsin-Ying, Qi, Xiaoding, Huang, Jow-Lay

Contributors: Department of Materials Science and Engineering

Subject Terms: SiC, Liquid phase epitaxy, Thin film

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Relation: Ceramics International, Vol. 41, No. 6, pp. 7640-7644; http://ir.lib.ncku.edu.tw/handle/987654321/160952; http://ir.lib.ncku.edu.tw/bitstream/987654321/160952/1/index.html

Availability: https://doi.org/10.1016/j.ceramint.2015.02.091
http://ir.lib.ncku.edu.tw/handle/987654321/160952
http://ir.lib.ncku.edu.tw/bitstream/987654321/160952/1/index.html

Authors: Shen, T. M., Wang, S. J., Tung, Y. T., Hwang, R. L., Wu, C. C., Wu, Jeff, Diaz, Carlos H.

Contributors: Department of Electrical Engineering

Subject Terms: Stress memorization technique (SMT), Dislocation, Solid-phase epitaxy regrowth, Molecular dynamics (MD) simulation

File Description: 113 bytes; text/html

Relation: Computational Materials Science, Vol. 104, pp. 219-224; http://ir.lib.ncku.edu.tw/handle/987654321/160798; http://ir.lib.ncku.edu.tw/bitstream/987654321/160798/1/index.html

Availability: https://doi.org/10.1016/j.commatsci.2015.04.009
http://ir.lib.ncku.edu.tw/handle/987654321/160798
http://ir.lib.ncku.edu.tw/bitstream/987654321/160798/1/index.html

Authors: Tseng, Chun-Yen, Lee, Ching-Ting, Pchelyakov, Oleg P., Preobrazhenskii, Valerii V.

Contributors: Institute of Microelectronics

Subject Terms: GaAs/Si solar cells, �Low-temperature atomic layer epitaxy method, �Molecular beam epitaxial system, �Hole recessed structure

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Relation: Solar Energy, Vol. 118, pp. 1-6; http://ir.lib.ncku.edu.tw/handle/987654321/165786; http://ir.lib.ncku.edu.tw/bitstream/987654321/165786/1/index.html

Availability: https://doi.org/10.1016/j.solener.2015.04.045
http://ir.lib.ncku.edu.tw/handle/987654321/165786
http://ir.lib.ncku.edu.tw/bitstream/987654321/165786/1/index.html

Authors: 吳忠霖

Contributors: 物理學系

Subject Terms: 含硼三族氮化物半導體, 氮化硼, 分子束磊晶, 異質磊晶成長, 表面物理, 電, 子結構, Boron, Containing, III-nitride, Semiconductors, Nitride, Molecular, Beam, Epitaxy, Heteroepitaxial, Growth, Surface, Physics, Electronic, Structure

File Description: 129 bytes; text/html

Relation: http://ir.lib.ncku.edu.tw/handle/987654321/175995; http://ir.lib.ncku.edu.tw/bitstream/987654321/175995/1/index.html

Availability: http://ir.lib.ncku.edu.tw/handle/987654321/175995
http://ir.lib.ncku.edu.tw/bitstream/987654321/175995/1/index.html

Authors: 黃榮俊, 吳忠霖, 陳啟東, 林明發, 李晁逵

Contributors: 物理學系

Subject Terms: 拓樸絕緣體, 分子束磊晶技術, 自旋電子元件, 席貝克效應, 熱電特性, Topological, insulators, molecular, beam, epitaxy, spintronic, devices, Seeback, effect, thermoelectric

File Description: 129 bytes; text/html

Relation: http://ir.lib.ncku.edu.tw/handle/987654321/175984; http://ir.lib.ncku.edu.tw/bitstream/987654321/175984/1/index.html

Availability: http://ir.lib.ncku.edu.tw/handle/987654321/175984
http://ir.lib.ncku.edu.tw/bitstream/987654321/175984/1/index.html

Authors: Hsu, Chao-Wei, Chen, Yung-Feng, Su, Yan-Kuin

Contributors: Department of Electrical Engineering

Subject Terms: Metal-organic vapor-phase epitaxy, ultraviolet, photodetectors, GaN

Relation: IEEE Journal of Quantum Electronics, Vol. 50, No. 1, pp. 35-41; http://ir.lib.ncku.edu.tw/handle/987654321/154837; http://ir.lib.ncku.edu.tw/bitstream/987654321/154837/-1/index.html

Availability: https://doi.org/10.1109/JQE.2013.2292502
http://ir.lib.ncku.edu.tw/handle/987654321/154837
http://ir.lib.ncku.edu.tw/bitstream/987654321/154837/-1/index.html

Authors: 楊仕寬, Yang, Shih-Kuan

Contributors: 機械工程學系, 楊天祥, Yang, Tian-Shiang

Subject Terms: MOCVD, 數值計算, 熱分析, 磊晶均勻性, 最佳化, numerical calculation, heat analysis, epitaxy uniformity, optimization

File Description: 142 bytes; text/html

Relation: http://ir.lib.ncku.edu.tw/handle/987654321/209020; http://ir.lib.ncku.edu.tw/bitstream/987654321/209020/1/index.html

Availability: http://ir.lib.ncku.edu.tw/handle/987654321/209020
http://ir.lib.ncku.edu.tw/bitstream/987654321/209020/1/index.html

Authors: 蔡明潔, Tsai, Ming-Chieh

Contributors: 物理學系, 黃榮俊, Huang, Jung-Chung

Subject Terms: 分子束磊晶, 磁性拓樸絕緣體, 角解析光電子能譜, 反鐵磁性, MnBi2Te4, Molecular beam epitaxy, Topological insulator, ARPES, Antiferromagnetic

File Description: 142 bytes; text/html

Relation: http://ir.lib.ncku.edu.tw/handle/987654321/205639; http://ir.lib.ncku.edu.tw/bitstream/987654321/205639/1/index.html

Availability: http://ir.lib.ncku.edu.tw/handle/987654321/205639
http://ir.lib.ncku.edu.tw/bitstream/987654321/205639/1/index.html

Authors: Lee, Kai-Hsuan, Chang, Sheng-Po, Lu, Kuang-Wei, Chang, Ping-Chuan, Chang, Shoou-Jinn, Chen, Tse-Pu, Shiu, Hung-Wei, Chang, Lo-Yueh, Chen, Chia-Hao

Contributors: Institute of Microelectronics

Subject Terms: InN, Nanorod, Glass Substrate, Molecular Beam Epitaxy, Heteroepitaxy

Relation: SCIENCE OF ADVANCED MATERIALS, Vol. 5, No. 7, pp. 873-880; http://ir.lib.ncku.edu.tw/handle/987654321/147964; http://ir.lib.ncku.edu.tw/bitstream/987654321/147964/-1/index.html

Availability: https://doi.org/10.1166/sam.2013.1533
http://ir.lib.ncku.edu.tw/handle/987654321/147964
http://ir.lib.ncku.edu.tw/bitstream/987654321/147964/-1/index.html

Authors: Wu, T. H., Su, Y. K., Chuang, R. W., Huang, C. Y., Wu, H. J., Lin, Y. C.

Contributors: Institute of Microelectronics

Subject Terms: X-ray diffraction, Metalorganic vapor phase epitaxy, Nitrides, Semiconducting III-V materials, Solar cells

Relation: JOURNAL OF CRYSTAL GROWTH, Vol. 370, pp. 236-239; http://ir.lib.ncku.edu.tw/handle/987654321/147932; http://ir.lib.ncku.edu.tw/bitstream/987654321/147932/-1/index.html

Availability: https://doi.org/10.1016/j.jcrysgro.2012.07.027
http://ir.lib.ncku.edu.tw/handle/987654321/147932
http://ir.lib.ncku.edu.tw/bitstream/987654321/147932/-1/index.html

Authors: Huang, C. T., Wu, J. D., Liu, C. F., Huang, Y. S., Wan, C. T., Su, Y. K., Tiong, K. K.

Contributors: Institute of Microelectronics

Subject Terms: Optical Characterization, Metal-organic vapor phase epitaxy, Semiconducting III-V materials

Relation: JOURNAL OF CRYSTAL GROWTH, Vol. 370, pp. 182-185; http://ir.lib.ncku.edu.tw/handle/987654321/147931; http://ir.lib.ncku.edu.tw/bitstream/987654321/147931/-1/index.html

Availability: https://doi.org/10.1016/j.jcrysgro.2012.07.018
http://ir.lib.ncku.edu.tw/handle/987654321/147931
http://ir.lib.ncku.edu.tw/bitstream/987654321/147931/-1/index.html

Authors: Hsiao, Chun-Lung, Qi, Xiaoding

Contributors: Department of Materials Science and Engineering

Subject Terms: LaNiO3, Epitaxy, Oxide conductor

Relation: THIN SOLID FILMS, Vol. 529, pp. 356-359; http://ir.lib.ncku.edu.tw/handle/987654321/147572; http://ir.lib.ncku.edu.tw/bitstream/987654321/147572/-1/index.html

Availability: https://doi.org/10.1016/j.tsf.2012.05.049
http://ir.lib.ncku.edu.tw/handle/987654321/147572
http://ir.lib.ncku.edu.tw/bitstream/987654321/147572/-1/index.html